| Adolfo Maia Jr. (UNICAMP, Brazil) | Luis Jure (U. Republica, Uruguay) |
| Aluizio Arcela (UNB, Brazil) | Marcelo Gomes Queiroz (USP, Brazil) |
| Andrew Horner (HKUST, Hong Kong) | Marcelo Soares Pimenta (UFRGS, Brazil) |
| Chris Chafe (Stanford U., USA) | Marcelo Wanderley (McGill U., Canada) |
| Edilson Ferneda (UCB, Brazil) | Marcio Brandão (UNB, Brazil) |
| Eduardo Reck Miranda (U. Plymouth, UK) | Matt Wright (U. Berkeley, USA) |
| Emilios Cambouropoulos (AUT, Greece) | Maurício Loureiro (UFMG, Brazil) |
| Fabio Kon (USP, Brazil) | Oscar Pablo di Liscia (U. Quilmes, Argentina) |
| Flavio S. C. Silva (USP, Brazil) | Palle Dahlstedt (Chalmers U. Technology, Sweden) |
| François Déchelle (IRCAM, France) | Peter Beyls (St. Lukas Art School, Belgium) |
| Furio Damiani(Unicamp, Brazil) | Petri Toiviainen (U. Jyvaskyla, Finland) |
| Geber Ramalho (UFPE, Brazil) | Roger Dannenberg (CMU, USA) |
| Henkjan Honing (U. Amsterdam, Netherlands) | Rosa Maria Vicari (UFRGS, Brazil) |
| Ian Whalley (U. Waikato, New Zealand) | Sever Tipei (U. Illinois Urbana-Champaign, USA) |
| Jürgen Bräuninger (U. Natal, South Africa) | Victor Lazzarini (NUI, Ireland) |
| Lelio Camilleri (U. Firenze, Italy) | |